Inventor
Daiki Yamatani
Inventor
Shizuoka, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
H05GX-ray technique23%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light8%
G02BOptical elements, systems or apparatus8%
G21KHandling of particles or ionising radiation not otherwise provided for8%
H01JElectric discharge tubes or discharge lamps8%
H01LSemiconductor devices8%
H05HPlasma technique8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
10,609,802High-temperature plasma raw material supply apparatus and extreme ultra violet light source apparatus20208,841,625'Method for the detection of the irradiance distribution in an extreme ultraviolet light source device and an extreme ultraviolet light source device'20148,785,893'Extreme ultraviolet light source and positioning method of light focusing optical means'20146,982,421'Extreme ultraviolet source'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2020Patents assigned to USHIO ELECTRIC INC (4)· patent assignee history
2006–2014Based in Shizuoka, JP· patent location history
2014Patents assigned to YAMATANI DAIKI (2)· patent assignee history
2014Based in Gotenba, JP· patent location history
2020Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| USHIO ELECTRIC INC | 4 | 2006–2020 |
| YAMATANI DAIKIself | 2 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 2 | 2006–2014 |
| Tokyo, JP | 1 | 2020 |
| Gotenba, JP | 1 | 2014 |