Inventor
THORSTEN LILL
Inventor
US
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H10BElectronic memory devices16%
H01LSemiconductor devices14%
H10NElectric solid-state devices not otherwise provided for14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
H01JElectric discharge tubes or discharge lamps7%
C23CCoating metallic material5%
G11CStatic stores5%
F04DNon-positive-displacement pumps2%
G06FElectric digital data processing2%
PatentTitleYear
12,302,760Ion beam etching with sidewall cleaning202512,127,486Resistive random access memory with preformed filaments202412,106,946Turbomolecular pump and cathode assembly for etching reactor202412,029,133Ion beam etching with sidewall cleaning202411,832,533Conformal damage-free encapsulation of chalcogenide materials202311,792,987Self-aligned vertical integration of three-terminal memory devices202311,637,022Electron excitation atomic layer etch202311,520,953Predicting etch characteristics in thermal etching and atomic layer etching202211,380,556Thermal atomic layer etch with rapid temperature cycling202211,289,306Ion beam etching utilizing cryogenic wafer temperatures202211,239,420Conformal damage-free encapsulation of chalcogenide materials2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to LAM RES CORP (11)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 11 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 11 | 2022–2025 |