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Inventor

Kathleen H. Martinek

Inventor
Newburgh, NY, US

Overview

2→
Patents
2000–2001
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
PatentTitleYear
6,245,492'Photoresist system and process for aerial image enhancement'20016,074,800'Photo acid generator compounds, photo resists, and method for improving bias'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2001Patents assigned to IBM (2)· patent assignee history
2000–2001Based in Newburgh, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM22000–2001
Locations
LocationPatentsSpan
Newburgh, New York, US22000–2001