Inventor
WARD JOHNSON
Inventor
US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C23CCoating metallic material17%
H10DInorganic electric semiconductor devices17%
H10BElectronic memory devices8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
12,518,970Methods for depositing a titanium aluminum carbide film structure on a substrate and related semiconductor structures202612,020,938Method of forming an electrode on a substrate and a semiconductor device structure including an electrode202411,837,483Wafer handling chamber with moisture reduction202311,501,973Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures202211,398,382Method of forming an electrode on a substrate and a semiconductor device structure including an electrode202211,270,899Wafer handling chamber with moisture reduction2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to ASM IP HOLDING BV (6)· patent assignee history
2022–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM IP HOLDING BV | 6 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 6 | 2022–2026 |