Inventor

Shinji Okazaki

Inventor

Urawa, JP

Overview

1981–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 46 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%

H01JElectric discharge tubes or discharge lamps11%

B82YSpecific uses or applications of nanostructures10%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

H04MTelephonic communication6%

H04BTransmission5%

H04WWireless communication networks5%

Y02DClimate change mitigation technologies in information and communication technologies [ict], i.e. information and communication technologies aiming at the reduction of their own energy use5%

G06TImage data processing or generation, in general4%

PatentTitleYear

10,863,613EUV light generator2020 10,512,149Extreme UV light generation device2019 9,507,248'Two-beam interference apparatus and two-beam interference exposure system'2016 8,989,225'Laser apparatus'2015 8,575,547'Electron beam measurement apparatus'2013 8,064,681'Method and apparatus for inspecting reticle'2011 7,943,903'Defect inspection method and its system'2011 7,884,325'Electron beam measurement apparatus'2011 7,337,228'Information processing method and apparatus and recording medium for controlling and simplifying a sign-up operation of an apparatus over a network'2008 7,162,240'Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control system'2007 7,139,572'Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control system'2006 7,130,631'Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control system'2006 7,050,573'Method of generating ring tones using melody and communication terminal apparatus'2006 6,987,970'Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control system'2006 6,889,043'Method of controlling a communication terminal having a plurality of functions, communication terminal apparatus, communication control system'2005 6,525,336'Superfine electronic device and method for making same'2003 6,463,652'Apparatus and methods for manufacturing hot rolled steel sheets'2002 6,020,109'Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices'2000 5,932,395'Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices'1999 5,902,705'Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices'1999 5,895,741'Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system'1999 5,757,409'Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus'1998 5,700,601'Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system'1997 5,691,115'Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices'1997 5,680,330'Method of and apparatus for calculating diameter of bundle of electric leads'1997 5,621,497'Pattern forming method and projection exposure tool therefor'1997 5,557,314'Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus'1996 5,512,328'Method for forming a pattern and forming a thin film used in pattern formation'1996 5,424,173'Electron beam lithography system and method'1995 5,402,410'High density storage of information on a substrate with multiple depth and height'1995 5,334,845'Charged beam exposure method and apparatus as well as aperture stop and production method thereof'1994 5,334,282'Electron beam lithography system and method'1994 5,305,364'Projection type X-ray lithography apparatus'1994 5,283,440'Electron beam writing system used in a cell projection method'1994 5,250,812'Electron beam lithography using an aperture having an array of repeated unit patterns'1993 5,097,138'Electron beam lithography system and method'1992 5,061,599'Radiation sensitive materials'1991 4,983,864'Electronic beam drawing apparatus'1991 4,798,470'Pattern printing method and apparatus'1989 4,740,693'Electron beam pattern line width measurement system'1988 4,729,965'Method of forming extrinsic base by diffusion from polysilicon/silicide source and emitter by lithography'1988 4,723,903'Stamper for replicating high-density data recording disks'1988 4,514,556'4,4\'-Methylene-bis-(2-ethyl-5-methyl imidazole) and methods of producing and using the same'1985 4,403,151'Method of forming patterns'1983 4,315,984'Method of producing a semiconductor device'1982 4,307,176'Method of forming a pattern'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1981–2003Patents assigned to HITACHI LTD (28)· patent assignee history

1981–2003Based in Urawa, JP· patent location history

2005–2008Patents assigned to SONY CORP (7)· patent assignee history

2005–2008Based in Kanagawa, JP· patent location history

2011–2013Patents assigned to HITACHI HIGH TECH CORP (4)· patent assignee history

2011–2015Patents assigned to OKAZAKI SHINJI (3)· patent assignee history

2011–2013Based in Saitama, JP· patent location history

2015–2020Patents assigned to GIGAPHOTON INC (4)· patent assignee history

2015–2016Based in Tochigi, JP· patent location history

2019–2020Based in Oyama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI LTD	28	1981–2003
SONY CORP	7	2005–2008
GIGAPHOTON INC	4	2015–2020
HITACHI HIGH TECH CORP	4	2011–2013
OKAZAKI SHINJIself	3	2011–2015

Locations

Location	Patents	Span
Urawa, JP	28	1981–2003
Kanagawa, JP	7	2005–2008
Saitama, JP	4	2011–2013
Oyama, JP	2	2019–2020
Tochigi, JP	2	2015–2016