Inventor
SANGYOON WOO
Inventor
BE
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
H01LSemiconductor devices20%
PatentTitleYear
12,566,377Multiple patterning with organometallic photopatternable layers with intermediate freeze steps202611,886,116Multiple patterning with organometallic photopatternable layers with intermediate freeze steps202411,599,021Photoresist compositions and methods for fabricating semiconductor devices using the same202311,327,398Photoresist compositions and methods for fabricating semiconductor devices using the same2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to INPRIA CORP (4)· patent assignee history
2022–2023Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
2022–2026Based in BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INPRIA CORP | 4 | 2022–2026 |
| SAMSUNG ELECTRONICS CO LTD | 2 | 2022–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| BE | 4 | 2022–2026 |