Inventor

Vladimir Vitalevitch Ivanov

Inventor

Moscow, RU

Overview

2005–2013

Patent span

Physics

Primary field (CPC G)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%

H05GX-ray technique18%

B82YSpecific uses or applications of nanostructures15%

B08BCleaning in general7%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light7%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%

G21KHandling of particles or ionising radiation not otherwise provided for2%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%

PatentTitleYear

8,598,550'Ex-situ removal of deposition on an optical element'2013 8,362,444'Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method'2013 8,134,136'Ex-situ removal of deposition on an optical element'2012 8,018,574'Lithographic apparatus, radiation system and device manufacturing method'2011 7,838,853'Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method'2010 7,812,330'Radical cleaning arrangement for a lithographic apparatus'2010 7,767,989'Ex-situ removal of deposition on an optical element'2010 7,696,492'Radiation system and lithographic apparatus'2010 7,696,493'Radiation system and lithographic apparatus'2010 7,684,012'Lithographic device, device manufacturing method and device manufactured thereby'2010 7,557,366'Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby'2009 7,518,134'Plasma radiation source for a lithographic apparatus'2009 7,504,643'Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement'2009 7,501,642'Radiation source'2009 7,495,239'Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement'2009 7,462,850'Radical cleaning arrangement for a lithographic apparatus'2008 7,462,851'Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured thereby'2008 7,372,058'Ex-situ removal of deposition on an optical element'2008 7,335,900'Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby'2008 7,279,690'Lithographic apparatus and device manufacturing method'2007 7,251,012'Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris'2007 7,208,746'Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby'2007 7,135,692'Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation'2006 7,061,574'Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby'2006 6,862,075'Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2013Patents assigned to ASML NETHERLANDS BV (25)· patent assignee history

2005–2013Based in Moscow, RU· patent location history

2012–2013Patents assigned to BANINE VADIM YEVGENYEVICH (3)· patent assignee history

2012–2013Patents assigned to IVANOV VLADIMIR VITALEVITCH (3)· patent assignee history

2012–2013Patents assigned to KRIVTSUN VLADIMIR MIHAILOVITCH (2)· patent assignee history

2012–2013Patents assigned to RIDDER JOHANNES BERNARDUS (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	25	2005–2013
BANINE VADIM YEVGENYEVICH	3	2012–2013
IVANOV VLADIMIR VITALEVITCHself	3	2012–2013
KRIVTSUN VLADIMIR MIHAILOVITCH	2	2012–2013
RIDDER JOHANNES BERNARDUS	2	2012–2013

Locations

Location	Patents	Span
Moscow, RU	25	2005–2013