Inventor
Waki Ohkubo
Inventor
Kanagawa, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests31%
C07CAcyclic or carbocyclic compounds15%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds15%
PatentTitleYear
7,858,286'Positive resist composition and method for forming resist pattern'20107,781,144'Positive resist composition and resist pattern forming method'20107,192,687'Positive resist composition and method of forming resist pattern using same'20076,180,313'Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same'20016,153,733'(Disulfonyl diazomethane compounds)'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2010Patents assigned to TOKYO OHKA KOGYO CO LTD (5)· patent assignee history
2000Patents assigned to DAITO CHEMIX CORP (1)· patent assignee history
2000–2010Based in Kanagawa, JP· patent location history
2007–2010Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 5 | 2000–2010 |
| DAITO CHEMIX CORP | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 3 | 2000–2010 |
| Kawasaki, JP | 2 | 2007–2010 |