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Inventor

Tsung-Hung Chu

Inventor
Bade City, TW

Overview

3→
Patents
2016–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
PatentTitleYear
11,018,021Curing photo resist for improving etching selectivity202110,347,505Curing photo resist for improving etching selectivity20199,305,839'Curing photo resist for improving etching selectivity'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (1)· patent assignee history
2016–2021Based in Bade City, TW· patent location history
2019–2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD22019–2021
TAIWAN SEMICONDUCTOR MFG12016
Locations
LocationPatentsSpan
Bade City, TW32016–2021