Inventor

Marco Adrianus Peter Van Den Heuvel

Inventor
Waalre, NL

Overview

4→
Patents
2012–2020
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them11%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2020Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2012–2013Patents assigned to COMPEN RENE THEODORUS PETRUS (2)· patent assignee history
2012–2013Patents assigned to VAN DEN HEUVEL MARCO ADRIANUS PETER (2)· patent assignee history
2012–2013Patents assigned to VAN NUNEN GERARDUS PETRUS MATTHIJS (2)· patent assignee history
2012Patents assigned to ALBERTI JOZEF AUGUSTINUS MARIA (1)· patent assignee history
2012–2020Based in Waalre, NL· patent location history
2017Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV42012–2020
COMPEN RENE THEODORUS PETRUS22012–2013
VAN DEN HEUVEL MARCO ADRIANUS PETERself22012–2013
VAN NUNEN GERARDUS PETRUS MATTHIJS22012–2013
ALBERTI JOZEF AUGUSTINUS MARIA12012
Locations
LocationPatentsSpan
Waalre, NL32012–2020
Veldhoven, NL12017