LexDanaLexDanabeta
Inventor

Taro Ikeda

Inventor
Nirasaki, JP

Overview

68→
Patents
1987–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 68 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B65Hprimary
B65HHandling thin or filamentary material, e.g. sheets, webs, cables20%
H01JElectric discharge tubes or discharge lamps18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
C23CCoating metallic material10%
G03GElectrography9%
H05HPlasma technique7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
H01PWaveguides2%
B05BSpraying apparatus1%
B42CBookbinding1%
PatentTitleYear
10,804,078Plasma processing apparatus and gas introduction mechanism202010,777,389Plasma processing apparatus and plasma processing method202010,727,030Microwave plasma source and plasma processing apparatus202010,557,200Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate202010,443,130Plasma processing apparatus with shower plate having protrusion for suppressing film formation in gas holes of shower plate201910,319,567Microwave plasma source and plasma processing apparatus201910,211,032Microwave plasma source and plasma processing apparatus20199,702,913'Acquisition method for S-parameters in microwave introduction modules, and malfunction detection method'20179,704,693'Power combiner and microwave introduction mechanism'20179,663,856'Plasma processing apparatus and shower plate'20179,552,966'Antenna for plasma generation, plasma processing apparatus and plasma processing method'20179,548,187'Microwave radiation antenna, microwave plasma source and plasma processing apparatus'20179,543,123'Plasma processing apparatus and plasma generation antenna'20179,520,272'Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatus'20169,281,154'Microwave introducing mechanism, microwave plasma source and microwave plasma processing apparatus'20169,204,500'Microwave heating apparatus and processing method'20159,072,158'Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portion'20159,061,851'Sheet feeding device and image forming apparatus'20158,945,342'Surface wave plasma generating antenna and surface wave plasma processing apparatus'20158,740,214'Sheet feeding apparatus and image forming apparatus'20148,708,328'Sheet feeding apparatus and image forming system'20148,628,076'Sheet feeding device and image forming apparatus'20148,585,052'Image forming apparatus'20138,480,074'Sheet feeding device and image forming apparatus'20138,424,866'Sheet feeding apparatus and image forming apparatus'20138,419,008'Image forming apparatus'20138,398,072'Sheet feeding apparatus and image forming apparatus'20138,328,181'Sheet feeding apparatus and image forming system'20128,308,898'Tuner and microwave plasma source'20128,238,778'Image forming apparatus with vibration generating source and damping member'20128,207,061'Semiconductor device manufacturing method using valve metal and nitride of valve metal'20128,133,811'Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, computer program and storage medium'20128,129,271'Film forming method, film forming apparatus and storage medium'20128,113,499'Sheet processing apparatus and image forming apparatus provided with the same'20128,083,223'Sheet conveying apparatus and image forming apparatus'20118,029,873'Film deposition method and film deposition apparatus of metal film'20118,026,176'Film forming method, plasma film forming apparatus and storage medium'20117,850,162'Sheet feeding device and image forming apparatus'20107,837,828'Substrate supporting structure for semiconductor processing, and plasma processing device'20107,790,626'Plasma sputtering film deposition method and equipment'20107,789,458'Structure of coupling portions of exterior parts'20107,772,111'Substrate processing method and fabrication process of a semiconductor device'20107,762,540'Sheet processing apparatus and image forming apparatus provided with the same'20107,753,358'Tabbed sheet support unit, sheet feeding device, and image forming apparatus'20107,748,320'Sheet feeding device and image forming apparatus'20107,744,081'Image forming apparatus'20107,684,078'Image forming apparatus'20107,677,553'Sheet feeding apparatus and image forming apparatus'20107,635,125'Sheet feeding apparatus and image forming apparatus'20097,591,459'Sheet feeding apparatus and image forming apparatus'20097,578,946'Plasma processing system and plasma processing method'20097,578,497'Sheet processing apparatus and image forming apparatus equipped with the same'20097,530,560'Sheet processing apparatus and image forming apparatus provided with the same'20097,513,954'Plasma processing apparatus and substrate mounting table employed therein'20097,461,839'Sheet feeding apparatus and image forming apparatus'20087,429,037'Sheet processing apparatus and image forming apparatus equipped with the same'20087,410,156'Sheet processing apparatus and image forming apparatus equipped with the same'20087,380,781'Sheet feeding device and image forming apparatus'20087,332,426'Substrate processing method and fabrication process of a semiconductor device'20087,288,059'Sheet processing apparatus and image forming apparatus equipped with the same'20077,200,351'Image forming apparatus featuring a developing device which abuts and retracts from an image bearing member'20077,122,477'Method of plasma treatment'20067,063,871'CVD process capable of reducing incubation time'20067,009,730'Image forming apparatus'20066,970,671'Image forming apparatus'20056,947,689'Image forming apparatus'20056,757,084'Image reading apparatus and control method thereof'20044,688,648'Method of and apparatus for crushing earth under the ground'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2015Based in Tokyo, JP· patent location history
2004–2015Patents assigned to CANON KK (34)· patent assignee history
2005–2007Based in Chiba, JP· patent location history
2006–2020Patents assigned to TOKYO ELECTRON LTD (30)· patent assignee history
2006–2020Based in Nirasaki, JP· patent location history
2011–2017Patents assigned to IKEDA TARO (18)· patent assignee history
2012–2017Patents assigned to KASAI SHIGERU (4)· patent assignee history
2012–2015Patents assigned to YAMANAKA YUJI (4)· patent assignee history
2013Based in Toyko, JP· patent location history
2015–2020Based in Yamanashi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK342004–2015
TOKYO ELECTRON LTD302006–2020
IKEDA TAROself182011–2017
KASAI SHIGERU42012–2017
YAMANAKA YUJI42012–2015
Locations
LocationPatentsSpan
Nirasaki, JP272006–2020
Tokyo, JP271987–2015
Yamanashi, JP52015–2020
Chiba, JP32005–2007
Toyko, JP12013