LexDanaLexDanabeta
Inventor

ROBERTO B. WIENER

Inventor
US

Overview

3→
Patents
2025–2026
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
H01LSemiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
12,529,963Fast uniformity drift correction202612,405,227Method for region of interest processing for reticle particle detection202512,189,312Reticle gripper damper and isolation system for lithographic apparatuses2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025–2026Patents assigned to ASML HOLDING NV (3)· patent assignee history
2025Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2025–2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML HOLDING NV32025–2026
ASML NETHERLANDS BV12025
Locations
LocationPatentsSpan
US32025–2026