Inventor

Ronald Casper Kunst

Inventor
Geldrop, NL

Overview

9→
Patents
2007–2014
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices64%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
Y02PClimate change mitigation technologies in the production or processing of goods7%
Y10TTechnical subjects covered by former us classification7%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2014Patents assigned to ASML NETHERLANDS BV (8)· patent assignee history
2007–2010Based in Eindhoven, NL· patent location history
2010–2014Based in Geldrop, NL· patent location history
2012–2014Patents assigned to KUNST RONALD CASPER (4)· patent assignee history
2012–2014Patents assigned to KAMIDI RAMIDIN IZAIR (2)· patent assignee history
2014Patents assigned to DE VOS YOUSSEF KAREL MARIA (2)· patent assignee history
2014Patents assigned to AMSL NETHERLANDS B V (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV82007–2014
KUNST RONALD CASPERself42012–2014
DE VOS YOUSSEF KAREL MARIA22014
KAMIDI RAMIDIN IZAIR22012–2014
AMSL NETHERLANDS B V12014
Locations
LocationPatentsSpan
Geldrop, NL52010–2014
Eindhoven, NL42007–2010