Inventor
Ji Young Hwang
Inventor
Daejeon, KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
H01LSemiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
C07CAcyclic or carbocyclic compounds6%
C07KPeptides6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
C08LCompositions of macromolecular compounds6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C09JAdhesives6%
PatentTitleYear
10,969,677Film mask, method for manufacturing same, and method for forming pattern using film mask202110,969,686Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby202110,927,073Compound for a curable composition202110,370,676Genes related to salt or drought stress resistances and transformed plants with the same2019Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2019Patents assigned to UNIV YONSEI IACF (1)· patent assignee history
2019Based in Seoul, KR· patent location history
2021Patents assigned to LG CHEMICAL LTD (3)· patent assignee history
2021Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LG CHEMICAL LTD | 3 | 2021 |
| UNIV YONSEI IACF | 1 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 3 | 2021 |
| Seoul, KR | 1 | 2019 |