Inventor
Kuniyoshi Suzuki
Inventor
Fukushima, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
B08BCleaning in general22%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them11%
PatentTitleYear
5,881,748'Apparatus for rinsing wafers adhered with chemical liquid by use of purified water'19995,651,836'Method for rinsing wafers adhered with chemical liquid by use of purified water'19975,484,748'Method for storage of silicon wafer'19964,179,197'Sound motion picture projection system'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979Patents assigned to CANON KK (1)· patent assignee history
1979Based in Machida, JP· patent location history
1996–1999Patents assigned to SHINETSU HANDOTAI KK (3)· patent assignee history
1996–1999Based in Fukushima, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU HANDOTAI KK | 3 | 1996–1999 |
| CANON KK | 1 | 1979 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fukushima, JP | 3 | 1996–1999 |
| Machida, JP | 1 | 1979 |