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Inventor

Yukimasa Saito

Inventor
Tokyo, JP

Overview

17→
Patents
2000–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
C23CCoating metallic material20%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them6%
C30BSingle-crystal growth4%
F21VFunctional features or details of lighting devices or systems thereof4%
F21YIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to the form or the kind of the light sources or of the colour of the light emitted4%
G02BOptical elements, systems or apparatus4%
G06FElectric digital data processing4%
H01LSemiconductor devices4%
H04NPictorial communication, e.g. television4%
PatentTitleYear
11,078,381Catechol-containing adhesive hydrogel, composition for preparing adhesive hydrogel, and compositions each including said adhesive hydrogel202110,976,648Information processing apparatus, information processing method, and program202110,955,960Control device, control method, and program202110,786,837Method for cleaning chamber of substrate processing apparatus202010,421,218Roller-type depressing device, imprinting device, and roller-type depressing method20198,070,302'Laminate type light-emitting diode device, and reflection type light-emitting diode unit'20118,057,046'Projector device having assembly of reflection type light emitting diodes'20117,479,619'Thermal processing unit'20097,144,823'Thermal treatment apparatus'20067,044,731'Heat treatment apparatus'20066,936,108'Heat treatment device'20056,807,971'Heat treatment apparatus and cleaning method of the same'20046,805,968'Members for semiconductor manufacturing apparatus and method for producing the same'20046,736,636'Thermal processor with gas supply'20046,383,300'Heat treatment apparatus and cleaning method of the same'20026,171,104'Oxidation treatment method and apparatus'20016,159,298'Thermal processing system'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2020Patents assigned to TOKYO ELECTRON LTD (10)· patent assignee history
2000–2001Based in Sagamihara, JP· patent location history
2002–2004Based in Kanagawa, JP· patent location history
2004–2021Based in Tokyo, JP· patent location history
2004–2006Based in Shiroyama, JP· patent location history
2011Patents assigned to HATANAKA MITSUYUKI (2)· patent assignee history
2011Patents assigned to IWASAKI ELECTRIC CO LTD (2)· patent assignee history
2011Patents assigned to KAWANABE YASUFUMI (2)· patent assignee history
2011Patents assigned to SAITO YUKIMASA (2)· patent assignee history
2011Based in Saitama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD102000–2020
HATANAKA MITSUYUKI22011
IWASAKI ELECTRIC CO LTD22011
KAWANABE YASUFUMI22011
SAITO YUKIMASAself22011
Locations
LocationPatentsSpan
Tokyo, JP42004–2021
Shiroyama, JP32004–2006
Saitama, JP22011
Kanagawa, JP22002–2004
Sagamihara, JP22000–2001