Inventor
Takahiro Adachi
Inventor
Tokyo, JP
Overview
Patents· 34 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution11%
G03GElectrography9%
H04LTransmission of digital information, e.g. telegraphic communication9%
G02BOptical elements, systems or apparatus8%
C08LCompositions of macromolecular compounds6%
G21CNuclear reactors6%
G21DNuclear power plant6%
H04WWireless communication networks6%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for3%
PatentTitleYear
10,640,090Optical device202010,568,043Communication device and communication method202010,513,168Vehicular optical system20199,939,758Developing device, and image forming apparatus and process cartridge incorporating same20189,936,461Communication device and communication method20189,690,254'Developing device, and image forming apparatus and process cartridge incorporating same'20179,690,233'Developing device, process cartridge, and image forming apparatus incorporating same'20179,410,540'Variable displacement hydraulic motor/pump'20169,335,662'Developing device and image forming apparatus and process cartridge incorporating same'20169,113,425'Communication device, a communication system and a communication control method'20158,917,758'Communication device, communication control method and a computer-readable storage medium'20148,779,267'Musical performance apparatus'20148,710,157'Contact lens material'20148,574,799'Electrophotographic photoreceptor'20138,501,878'Method for producing polycarbonate material having excellent solubility and affinity, and contact lens material comprising the same'20138,344,769'Jitter suppression circuit and jitter suppression method'20138,338,064'Polycarbonate resin composition and electrophotographic photosensitive body using the same'20128,173,720'Transparent gel and contact lense from the same'20127,920,664'Clock synchronization circuit'20117,511,089'Polyphenylene ether oligomer sulfonic acid salt, making method, flame retardant resin composition, and molded article'20097,456,682'Demodulator and phase compensation method thereof'20087,401,018'Foreign language learning apparatus, foreign language learning method, and medium'20087,248,644'Circuit and method for compensating for nonliner distortion of power amplifier'20076,782,070'Method of handling a large structure in a reactor building'20046,744,841'Method for carrying equipment out of nuclear power plant'20046,731,715'Reactor vessel handling method'20046,643,349'Method of removing a large-sized apparatus from a reactor building of a nuclear plant'20036,630,562'Polycarbonate resin'20036,625,245'Method of handling reactor vessel'20036,608,879'Method of handling a large structure in a reactor building'20036,452,993'Method of carrying out large-sized apparatus'20026,288,204'Branched polycarbonate resin and process for producing the same'20015,969,084'Process for producing polycarbonate resin with high flowability'19995,747,632'Polycarbonate resin with high flowability and process for producing the same'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2014Patents assigned to MITSUBISHI GAS CHEMICAL CO (10)· patent assignee history
2002–2004Patents assigned to HITACHI LTD (7)· patent assignee history
2002–2004Based in Hitachi, JP· patent location history
2004–2020Based in Tokyo, JP· patent location history
2007–2020Patents assigned to NEC CORP (8)· patent assignee history
2009–2014Based in Kamisu, JP· patent location history
2012–2020Patents assigned to ADACHI TAKAHIRO (15)· patent assignee history
2012–2013Based in Ibaraki, JP· patent location history
2016–2018Patents assigned to RICOH CO LTD (4)· patent assignee history
2016–2018Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADACHI TAKAHIROself | 15 | 2012–2020 |
| MITSUBISHI GAS CHEMICAL CO | 10 | 1998–2014 |
| NEC CORP | 8 | 2007–2020 |
| HITACHI LTD | 7 | 2002–2004 |
| RICOH CO LTD | 4 | 2016–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 9 | 2004–2020 |
| Hitachi, JP | 6 | 2002–2004 |
| Kanagawa, JP | 4 | 2016–2018 |
| Kamisu, JP | 3 | 2009–2014 |
| Ibaraki, JP | 3 | 2012–2013 |