Inventor
Shuichi Nagamine
Inventor
Koshi, JP
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1034%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
H01LSemiconductor devices16%
B08BCleaning in general9%
B05CApparatus for applying fluent materials to surfaces, in general5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B05BSpraying apparatus3%
Y10TTechnical subjects covered by former us classification3%
B05DProcesses for applying fluent materials to surfaces, in general1%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein1%
PatentTitleYear
10,979,751Communication management apparatus, method and computer-readable storage medium for generating image data identification information communication202110,700,166Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatus20209,484,230'Substrate liquid processing apparatus'20169,355,871'Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cup'20169,346,084'Liquid processing apparatus and liquid processing method'20169,275,881'Liquid processing apparatus, liquid processing method, and storage medium'20169,266,153'Substrate processing apparatus and substrate processing method'20169,073,103'Liquid processing apparatus, liquid processing method, and recording medium having computer program for performing the same method'20159,048,269'Substrate liquid treatment apparatus with lift pin plate'20159,022,045'Substrate liquid cleaning apparatus with controlled liquid port ejection angle'20158,881,751'Substrate liquid processing apparatus, method of controlling substrate liquid processing apparatus, and storage medium performing substrate liquid processing apparatus control method on substrate liquid processing apparatus'20148,869,811'Liquid processing apparatus and liquid processing method'20148,840,752'Flow passage switching apparatus, processing apparatus, flow passage switching method, processing method and storage medium'20148,671,875'Liquid processing apparatus, liquid processing method and storage medium'20148,539,906'Substrate liquid processing apparatus'20137,665,918'Developing apparatus, developing method and storage medium'2010D0610176'Coater cup'20106,843,259'Solution treatment unit'20056,730,599'Film forming method and film forming apparatus'20046,715,943'Solution treatment method and solution treatment unit'20046,602,382'Solution processing apparatus'20036,541,376'Film forming method and film forming apparatus'20036,533,864'Solution processing apparatus and method'20036,514,570'Solution processing apparatus and method'20036,384,894'Developing method and developing unit'20026,364,547'Solution processing apparatus'20026,332,723'Substrate processing apparatus and method'20016,267,516'Developing apparatus and developing nozzle'20016,241,402'Developing apparatus and method thereof'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2020Patents assigned to TOKYO ELECTRON LTD (28)· patent assignee history
2001–2003Based in Kikuchi-gun, JP· patent location history
2001Based in Suwa, JP· patent location history
2002–2016Based in Kumamoto, JP· patent location history
2010–2020Based in Koshi, JP· patent location history
2013–2016Patents assigned to NAGAMINE SHUICHI (10)· patent assignee history
2013–2016Patents assigned to OGATA NOBUHIRO (9)· patent assignee history
2015–2016Patents assigned to HIGASHIJIMA JIRO (3)· patent assignee history
2015Patents assigned to KAI YOSHIHIRO (2)· patent assignee history
2021Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 28 | 2001–2020 |
| NAGAMINE SHUICHIself | 10 | 2013–2016 |
| OGATA NOBUHIRO | 9 | 2013–2016 |
| HIGASHIJIMA JIRO | 3 | 2015–2016 |
| KAI YOSHIHIRO | 2 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 13 | 2010–2020 |
| Kumamoto, JP | 7 | 2002–2016 |
| Kikuchi-gun, JP | 7 | 2001–2003 |
| Kanagawa, JP | 1 | 2021 |
| Suwa, JP | 1 | 2001 |