Inventor
Yao-Chi Chang
Inventor
Tainan, TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H10DInorganic electric semiconductor devices25%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
PatentTitleYear
7,094,653'Method for forming STI structures with controlled step height'20066,919,259'Method for STI etching using endpoint detection'20056,455,433'Method for forming square-shouldered sidewall spacers and devices fabricated'20026,080,627'Method for forming a trench power metal-oxide semiconductor transistor'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000Patents assigned to MOSEL VITELIC INC (1)· patent assignee history
2000Based in Kaohsiung, TW· patent location history
2002–2006Patents assigned to TAIWAN SEMICONDUCTOR MFG (3)· patent assignee history
2002–2006Based in Tainan, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 3 | 2002–2006 |
| MOSEL VITELIC INC | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tainan, TW | 3 | 2002–2006 |
| Kaohsiung, TW | 1 | 2000 |