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Inventor

Max Stadler

Inventor
Haiming, DE

Overview

2→
Patents
1990–1995
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
B01FMixing, e.g. dissolving, emulsifying or dispersing20%
B08BCleaning in general20%
C11DDetergent compositions20%
PatentTitleYear
5,451,267'Process for the wet-chemical treatment of disk-shaped workpieces'19954,900,363'Method and liquid preparation for removing residues of auxiliary sawing materials from wafers'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–1995Patents assigned to WACKER CHEMITRONIC (2)· patent assignee history
1990–1995Based in Haiming, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
WACKER CHEMITRONIC21990–1995
Locations
LocationPatentsSpan
Haiming, DE21990–1995