Inventor

John Daugherty

Inventor

Fremont, CA, US

Overview

2000–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 59 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps20%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%

C23CCoating metallic material13%

H01LSemiconductor devices7%

Y10TTechnical subjects covered by former us classification6%

B08BCleaning in general4%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

C03CChemical composition of glasses, glazes or vitreous enamels3%

C25DProcesses for the electrolytic or electrophoretic production of coatings3%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%

PatentTitleYear

11,124,659Method to selectively pattern a surface for plasma resistant coat applications2021 11,112,773Systems for removing and replacing consumable parts from a semiconductor process module in situ2021 11,087,961Quartz component with protective coating2021 10,790,174Wafer transport assembly with integrated buffers2020 10,615,009System implementing machine learning in complex multivariate wafer processing equipment2020 10,557,197Monolithic gas distribution manifold and various construction techniques and use cases therefor2020 10,304,707Load lock interface and integrated post-processing module2019 10,014,196Wafer transport assembly with integrated buffers2018 9,972,478Method and process of implementing machine learning in complex multivariate wafer processing equipment2018 9,947,558Method for conditioning silicon part2018 9,929,028'Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs'2018 9,873,940Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus2018 9,623,449'Dielectric window cleaning apparatuses'2017 9,580,360'Monolithic ceramic component of gas delivery system and method of making and use thereof'2017 9,546,432'Dense oxide coated component of a plasma processing chamber and method of manufacture thereof'2017 9,505,036'Portable sonic particle removal tool with a chemically controlled working fluid'2016 9,502,275'Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs'2016 9,396,912'Methods for mixed acid cleaning of showerhead electrodes'2016 9,387,521'Method of wet cleaning aluminum chamber parts'2016 9,337,002'Corrosion resistant aluminum coating on plasma chamber components'2016 9,314,854'Ductile mode drilling methods for brittle components of plasma processing apparatuses'2016 9,293,305'Mixed acid cleaning assemblies'2016 9,123,651'Dense oxide coated component of a plasma processing chamber and method of manufacture thereof'2015 9,054,148'Method for performing hot water seal on electrostatic chuck'2015 8,945,317'System and method for cleaning gas injectors'2015 8,854,451'Automated bubble detection apparatus and method'2014 8,597,428'Vacuum sealing radio frequency (RF) and low frequency conducting actuator'2013 8,585,844'Extending lifetime of yttrium oxide as a plasma chamber material'2013 8,545,639'Method of cleaning aluminum plasma chamber parts'2013 8,486,841'Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof'2013 8,318,035'Methods of finishing quartz glass surfaces and components made by the methods'2012 8,292,698'On-line chamber cleaning using dry ice blasting'2012 8,097,105'Extending lifetime of yttrium oxide as a plasma chamber material'2012 8,022,718'Method for inspecting electrostatic chucks with Kelvin probe analysis'2011 7,685,965'Apparatus for shielding process chamber port'2010 7,605,086'Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof'2009 7,578,889'Methodology for cleaning of surface metal contamination from electrode assemblies'2009 7,578,945'Method and apparatus for tuning a set of plasma processing steps'2009 7,402,258'Methods of removing metal contaminants from a component for a plasma processing apparatus'2008 7,311,797'Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor'2007 7,300,537'Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor'2007 7,255,898'Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof'2007 7,250,114'Methods of finishing quartz glass surfaces and components made by the methods'2007 7,234,222'Methods and apparatus for optimizing the delivery of a set of gases in a plasma processing system'2007 7,138,067'Methods and apparatus for tuning a set of plasma processing steps'2006 7,128,804'Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof'2006 6,994,769'In-situ cleaning of a polymer coated plasma processing chamber'2006 6,830,622'Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof'2004 6,821,378'Pump baffle and screen to improve etch uniformity'2004 6,790,242'Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof'2004 6,776,851'In-situ cleaning of a polymer coated plasma processing chamber'2004 6,773,751'Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof'2004 6,770,214'Method of reducing aluminum fluoride deposits in plasma etch reactor'2004 6,620,520'Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof'2003 6,613,442'Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof'2003 6,537,429'Diamond coatings on reactor wall and method of manufacturing thereof'2003 6,533,910'Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof'2003 6,344,105'Techniques for improving etch rate uniformity'2002 6,016,766'Microwave plasma processor'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2021Patents assigned to LAM RES CORP (59)· patent assignee history

2000–2002Based in Oakland, CA, US· patent location history

2003–2013Based in Alameda, CA, US· patent location history

2004–2021Based in Fremont, CA, US· patent location history

2004–2012Based in Newark, CA, US· patent location history

2004Based in Alamada, CA, US· patent location history

2012–2017Patents assigned to DAUGHERTY JOHN (9)· patent assignee history

2012–2017Patents assigned to SHIH HONG (9)· patent assignee history

2012–2015Patents assigned to HUANG TUOCHUAN (4)· patent assignee history

2013–2017Patents assigned to AVOYAN ARMEN (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
LAM RES CORP	59	2000–2021
DAUGHERTY JOHNself	9	2012–2017
SHIH HONG	9	2012–2017
AVOYAN ARMEN	4	2013–2017
HUANG TUOCHUAN	4	2012–2015

Locations

Location	Patents	Span
Fremont, California, US	35	2004–2021
Alameda, California, US	11	2003–2013
Newark, California, US	10	2004–2012
Oakland, California, US	2	2000–2002
Alamada, California, US	1	2004