Inventor
Youxian Wen
Inventor
Livermore, CA, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties31%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
G01BMeasuring length, thickness or similar linear dimensions9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
G06TImage data processing or generation, in general6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
F16CShafts3%
G05BControl or regulating systems in general3%
G06FElectric digital data processing3%
G06KGraphical data reading3%
PatentTitleYear
10,975,906Cable adjusting device for vehicle20219,747,520'Systems and methods for enhancing inspection sensitivity of an inspection tool'20179,658,150'System and method for semiconductor wafer inspection and metrology'20179,645,097'In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning'20178,543,557'Evolution of library data sets'20137,639,375'Determining transmittance of a photomask using optical metrology'20097,613,598'Global shape definition method for scatterometry'20097,523,439'Determining position accuracy of double exposure lithography using optical metrology'20097,518,740'Evaluating a profile model to characterize a structure to be examined using optical metrology'20097,478,019'Multiple tool and structure analysis'20097,145,664'Global shape definition method for scatterometry'20067,085,676'Feed forward critical dimension control'20066,989,896'Standardized sample for characterizing the performance of a scatterometer'20066,898,596'Evolution of library data sets'20056,882,421'Apparatus for optical measurements of nitrogen concentration in thin films'20056,784,993'Apparatus for optical measurements of nitrogen concentration in thin films'20046,583,876'Apparatus for optical measurements of nitrogen concentration in thin films'20036,472,238'Evaluation of etching processes in semiconductors'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2006Patents assigned to THERMA WAVE INC (7)· patent assignee history
2002–2013Based in Livermore, CA, US· patent location history
2006–2009Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2009–2017Patents assigned to KLA TENCOR CORP (6)· patent assignee history
2009–2017Based in Fremont, CA, US· patent location history
2013Patents assigned to AIKENS DAVID M (1)· patent assignee history
2013Patents assigned to SMITH WALTER LEE (1)· patent assignee history
2021Based in Chang Hua Hsien, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| THERMA WAVE INC | 7 | 2002–2006 |
| KLA TENCOR CORP | 6 | 2009–2017 |
| TOKYO ELECTRON LTD | 4 | 2006–2009 |
| AIKENS DAVID M | 1 | 2013 |
| SMITH WALTER LEE | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Livermore, California, US | 10 | 2002–2013 |
| Fremont, California, US | 7 | 2009–2017 |
| Chang Hua Hsien, TW | 1 | 2021 |