Inventor
Stuart E. Brown
Inventor
Austin, TX, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
PatentTitleYear
6,780,568'Phase-shift photomask for patterning high density features'20046,562,521'Semiconductor feature having support islands'20036,410,191'Phase-shift photomask for patterning high density features'20026,405,144'Method and apparatus for programmed latency for improving wafer-to-wafer uniformity'20026,271,602'Method for reducing the susceptibility to chemical-mechanical polishing damage of an alignment mark formed in a semiconductor substrate'20016,207,966'Mark protection with transparent film'20016,178,256'Removal of reticle effect on critical dimension by reticle rotation'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2003Patents assigned to ADVANCED MICRO DEVICES INC (6)· patent assignee history
2001–2004Based in Austin, TX, US· patent location history
2004Patents assigned to ADVANCED MICRON DEVICES INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADVANCED MICRO DEVICES INC | 6 | 2001–2003 |
| ADVANCED MICRON DEVICES INC | 1 | 2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 7 | 2001–2004 |