Inventor
Christophe David Fouquet
Inventor
Retie, BE
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G06FElectric digital data processing14%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
G06NComputing arrangements based on specific computational models11%
G06TImage data processing or generation, in general8%
G01BMeasuring length, thickness or similar linear dimensions6%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes3%
G06VImage or video recognition or understanding3%
PatentTitleYear
11,080,459Computational wafer inspection202110,718,604Metrology method, target and substrate202010,579,772Computational wafer inspection202010,386,176Metrology method, target and substrate20199,990,462Computational wafer inspection20189,710,903'System and method for detecting design and process defects on a wafer using process monitoring features'20179,507,907'Computational wafer inspection'20168,175,373'Use of design information and defect image information in defect classification'20127,904,845'Determining locations on a wafer to be reviewed during defect review'20117,747,062'Methods, defect review tools, and systems for locating a defect in a defect review process'20107,219,069'System and method for creating dynamic facility models with data normalization as attributes change over time'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007Based in Alpharetta, GA, US· patent location history
2010–2017Based in Sunnyvale, CA, US· patent location history
2011–2017Patents assigned to KLA TENCOR CORP (3)· patent assignee history
2012–2017Patents assigned to FOUQUET CHRISTOPHE (2)· patent assignee history
2012Patents assigned to ABBOTT GORDON (1)· patent assignee history
2016–2021Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2016–2021Based in Retie, BE· patent location history
2017Patents assigned to EDELSTEIN SERGIO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2016–2021 |
| KLA TENCOR CORP | 3 | 2011–2017 |
| FOUQUET CHRISTOPHEself | 2 | 2012–2017 |
| ABBOTT GORDON | 1 | 2012 |
| EDELSTEIN SERGIO | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Retie, BE | 6 | 2016–2021 |
| Sunnyvale, California, US | 4 | 2010–2017 |
| Alpharetta, Georgia, US | 1 | 2007 |