Inventor
ALA MORADIAN
Inventor
US
Overview
Patents· 34 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
C30BSingle-crystal growth15%
H01LSemiconductor devices12%
H01JElectric discharge tubes or discharge lamps7%
G05BControl or regulating systems in general5%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G06FElectric digital data processing3%
G01DMeasuring not specially adapted for a specific variable2%
G06NComputing arrangements based on specific computational models2%
PatentTitleYear
12,597,587Process chambers having multiple cooling plates202612,593,643Batch thermal process chamber202612,584,218Plate assemblies, process kits, and processing chambers for semiconductor manufacturing202612,540,400Multi-flow gas circuits, processing chambers, and related apparatus and methods for semiconductor manufacturing202612,534,821Processing systems, chambers, and related methods including turbines for energy harnessing202612,535,799Sustainability monitoring platform with sensor support2026D1110334Display screen with graphical user interface202612,518,069Comprehensive modeling platform for manufacturing equipment202612,492,487Movable central reflectors of semiconductor processing equipment, and related systems and methods202512,467,144Methods of correlating zones of processing chambers, and related systems and methods202512,456,614Process kits and related methods for processing chambers to facilitate deposition process adjustability202512,449,309Methods for detection using optical emission spectroscopy202512,443,175Eco-efficiency (sustainability) dashboard for semiconductor manufacturing202512,428,731Flow guide structures and heat shield structures, and related methods, for deposition uniformity and process adjustability202512,385,159In-situ epi growth rate control of crystal thickness micro-balancing sensor202512,354,855Process kits and related methods for processing chambers to facilitate deposition process adjustability202512,334,341Chamber body feedthrough for in chamber resistive heating element202512,326,282Cooling flow in substrate processing according to predicted cooling parameters202512,324,061Epitaxial deposition chamber202512,228,905Eco-efficiency monitoring and exploration platform for semiconductor manufacturing202512,221,696Process kits and related methods for processing chambers to facilitate deposition process adjustability202512,196,617Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber202512,183,559Apparatus for temperature control in a substrate processing chamber202412,165,934Substrate processing monitoring202412,091,749Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet202412,060,651Chamber architecture for epitaxial deposition and advanced epitaxial film applications202412,018,372Gas injector for epitaxy and CVD chamber202412,001,197Eco-efficiency (sustainability) dashboard for semiconductor manufacturing202411,860,973Method and system for foreline deposition diagnostics and control202411,768,984Parameter sensing and computer modeling for gas delivery health monitoring202311,752,035Ultrasonic needles and transducer assemblies formed of non-metal materials or a combination of materials202311,733,081Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing system202311,261,538In-situ temperature mapping for epi chamber202211,162,168Substrate positioning apparatus and methods2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (32)· patent assignee history
2021–2026Based in US· patent location history
2023Patents assigned to BAUSCH & LOMB (1)· patent assignee history
2026Patents assigned to APPLIED MAT INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 32 | 2021–2026 |
| APPLIED MAT INC | 1 | 2026 |
| BAUSCH & LOMB | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 34 | 2021–2026 |