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Inventor

Luc Van Autryve

Inventor
Mennecy, FR

Overview

2→
Patents
2000–2003
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests22%
B08BCleaning in general11%
C23CCoating metallic material11%
C23FNon-mechanical removal of metallic material from surface11%
PatentTitleYear
6,579,796'Method of etching platinum using a silicon carbide mask'20036,014,979'Localizing cleaning plasma for semiconductor processing'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2000Based in Voinsles, FR· patent location history
2003Based in Mennecy, FR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC22000–2003
Locations
LocationPatentsSpan
Mennecy, FR12003
Voinsles, FR12000