Inventor
Yoshiaki Arai
Inventor
Yokohama, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds20%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients20%
PatentTitleYear
5,281,508'Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol'19944,882,260'Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye'19894,731,319'Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–1994Patents assigned to TOKYO OHKA KOGYO CO LTD (3)· patent assignee history
1988–1989Based in Yokohama, JP· patent location history
1994Based in Mountain View, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 3 | 1988–1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 2 | 1988–1989 |
| Mountain View, California, US | 1 | 1994 |