Inventor
PING-HSUN LIN
Inventor
TW
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
H01LSemiconductor devices16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
C01BNon-metallic elements4%
C23CCoating metallic material4%
B08BCleaning in general2%
B82YSpecific uses or applications of nanostructures2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
G01QScanning-probe techniques or apparatus2%
PatentTitleYear
12,578,270Mask characterization methods202612,578,652Photomask and methods for measuring and manufacturing the photomask202612,523,929Methods for removing catalyst particles from nanotube films202612,517,423Extreme ultraviolet mask with alloy based absorbers202612,400,864Methods and systems for improving plasma ignition stability202512,366,797EUV photo masks and manufacturing method thereof202512,353,120EUV photo masks and manufacturing method thereof202512,346,023Optical assembly with coating and methods of use202512,346,020Optical assembly with coating and methods of use202512,339,582Photomask including fiducial mark and method of making a photomask202512,265,322EUV mask blank and method of making EUV mask blank202512,181,797Extreme ultraviolet mask with alloy based absorbers202412,044,959EUV photo masks and manufacturing method thereof202412,001,132Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask202411,982,936Photomask and method of fabricating a photomask202411,860,532Photomask including fiducial mark and method of making a semiconductor device using the photomask202411,815,804EUV mask blank and method of making EUV mask blank202311,592,737EUV photo masks and manufacturing method thereof202311,435,660Photomask and method of fabricating a photomask202211,422,466Photomask including fiducial mark and method of making semiconductor device using the photomask202211,287,754Mask blank for lithography and method of manufacturing the same2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (21)· patent assignee history
2022–2026Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 21 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 21 | 2022–2026 |