Inventor
Hisashi Kawano
Inventor
Koshi, JP
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices35%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
B08BCleaning in general9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
B05BSpraying apparatus3%
B05CApparatus for applying fluent materials to surfaces, in general3%
H05KPrinted circuits3%
PatentTitleYear
10,792,711Substrate processing system, substrate cleaning method, and recording medium202010,651,061Substrate processing apparatus, substrate processing method and recording medium202010,272,478Substrate processing system, substrate cleaning method, and recording medium201910,192,758Substrate processing apparatus201910,121,646Substrate processing apparatus and substrate processing method201810,062,586Chemical fluid processing apparatus and chemical fluid processing method20189,953,840Substrate processing method and substrate processing system20189,922,849'Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof'20189,870,914'Substrate processing apparatus and substrate processing method'20189,818,598'Substrate cleaning method and recording medium'20179,805,957'Substrate processing apparatus, substrate processing method and computer-readable storage medium recording therein substrate processing program'20179,378,940'Substrate processing apparatus and substrate processing method'20167,924,396'Coating/developing apparatus and pattern forming method'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2020Patents assigned to TOKYO ELECTRON LTD (13)· patent assignee history
2011–2020Based in Koshi, JP· patent location history
2016–2018Based in Kumamoto, JP· patent location history
2017Patents assigned to JSR CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 13 | 2011–2020 |
| JSR CORP | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 9 | 2011–2020 |
| Kumamoto, JP | 4 | 2016–2018 |