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Inventor

Donghak JANG

Inventor
KR

Overview

1→
Patents
2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C01Gprimary
C01GCompounds containing metals not covered by subclasses c01d or c01f25%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds25%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium25%
C23CCoating metallic material25%
PatentTitleYear
11,208,723Organometallic precursor compound for vapor deposition for forming oxide thin film and method for manufacturing same2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to HANSOL CHEMICAL CO LTD (1)· patent assignee history
2021Based in KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HANSOL CHEMICAL CO LTD12021
Locations
LocationPatentsSpan
KR12021