Inventor
Yusuke Tajima
Inventor
Acton, MA, US
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
H03FAmplifiers14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%
H03DDemodulation or transference of modulation from one carrier to another7%
H03HImpedance networks, e.g. resonant circuits7%
B82YSpecific uses or applications of nanostructures5%
H01PWaveguides5%
H04BTransmission5%
H05KPrinted circuits5%
A61GTransport, personal conveyances, or accommodation specially adapted for patients or disabled persons2%
PatentTitleYear
10,021,769Light driving apparatus and light control system20189,653,964'Linear actuator'20179,030,255'Linearization circuit and related techniques'20158,810,314'Envelope tracking amplifier'20148,368,451'High power radio frequency (RF) switch'20138,289,085'Amplifier circuit'20128,224,264'RF amplifier modulation circuit and related techniques'20127,671,219'Method for manufacturing fullerene derivatives'20106,709,804'Printed wiring board and semiconductor device and processes to prepare the same'20046,528,231'PHOTOSENSITIVE RESIN COMPOSITION, PRINTED WIRING BOARD, SUBSTRATE FOR DISPOSING SEMICONDUCTOR CHIPS, SEMICONDUCTOR DEVICE AND PROCESSES FOR PRODUCING A PRINTED WIRING BOARD, A SUBSTRATE FOR DISPOSING SEMICONDUCTOR CHIPS AND A SEMICONDUCTOR DEVICE'2003RE037033'Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder'20015,998,089'Photosensitive resin composition comprising fullerene'19995,847,015'Pigment-dispersed radiation-sensitive composition for color filters'19985,368,976'Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder'19945,323,064'Radio frequency signal frequency converter'19945,025,225'Amplifier having substantially constant D.C. to r.f. conversion efficiency'19915,021,743'Biasing networks for matrix amplifiers'19915,021,756'Transversal and recursive filters useable in a diplexer'19914,787,686'Monolithic programmable attenuator'19884,709,410'Frequency conversion circuits'19874,684,965'Monolithic programmable attenuator'19874,662,000'Frequency conversion circuits'19874,660,006'Radio frequency multiplier producing an even harmonic output'19874,532,484'Hybrid coupler having interlaced coupling conductors'19854,211,986'Strip line coupler having spaced ground plate for increased coupling characteristic'1980Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1980–1998Based in Yokohama, JP· patent location history
1985–1994Patents assigned to RAYTHEON CO (10)· patent assignee history
1985–2015Based in Acton, MA, US· patent location history
1998–2001Patents assigned to JSR CORP (2)· patent assignee history
1999–2001Based in Tokyo, JP· patent location history
2003–2010Patents assigned to RIKEN (3)· patent assignee history
2003–2004Based in Asaka, JP· patent location history
2012–2015Patents assigned to AURIGA MEASUREMENT SYSTEMS LLC (5)· patent assignee history
2012–2013Patents assigned to TAJIMA YUSUKE (3)· patent assignee history
2018Based in Osaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| RAYTHEON CO | 10 | 1985–1994 |
| AURIGA MEASUREMENT SYSTEMS LLC | 5 | 2012–2015 |
| RIKEN | 3 | 2003–2010 |
| TAJIMA YUSUKEself | 3 | 2012–2013 |
| JSR CORP | 2 | 1998–2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Acton, Massachusetts, US | 15 | 1985–2015 |
| Yokohama, JP | 3 | 1980–1998 |
| Asaka, JP | 2 | 2003–2004 |
| Tokyo, JP | 2 | 1999–2001 |
| Osaka, JP | 1 | 2018 |