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Inventor

Jen-Ho Chen

Inventor
Taoyuan, TW

Overview

3→
Patents
2006–2021
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G06FElectric digital data processing17%
G06KGraphical data reading17%
G06NComputing arrangements based on specific computational models17%
H04LTransmission of digital information, e.g. telegraphic communication17%
PatentTitleYear
10,984,288Malicious software recognition apparatus and method20217,056,631'Exposure system and method with group compensation'20067,046,332'Exposure system and method with group compensation'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006Patents assigned to NANYA TECHNOLOGY CORP (2)· patent assignee history
2006Based in Taoyuan, TW· patent location history
2021Patents assigned to INST INFORMATION IND (1)· patent assignee history
2021Based in Taipei, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NANYA TECHNOLOGY CORP22006
INST INFORMATION IND12021
Locations
LocationPatentsSpan
Taoyuan, TW22006
Taipei, TW12021