Inventor
Ulrich Weber
Inventor
Ulm, DE
Overview
Patents· 53 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
G02BOptical elements, systems or apparatus34%
A61NElectrotherapy4%
B30BPresses in general3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
Y10TTechnical subjects covered by former us classification3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
E02DFoundations2%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light2%
A47BTables1%
PatentTitleYear
10,969,699Projection lighting system for semiconductor lithography with an improved heat transfer202110,777,958Beam reverser module and optical power amplifier having such a beam reverser module202010,215,948Optical element module with minimized parasitic loads201910,146,048Optical assembly, projection system, metrology system and EUV lithography apparatus201810,133,021Positioning unit and apparatus for adjustment of an optical element20189,843,153'Beam reverser module and optical power amplifier having such a beam reverser module'20179,766,550'Actuators and microlithography projection exposure systems and methods using the same'20179,709,895'Support elements for an optical element'20179,664,873'Positioning unit and apparatus for adjustment of an optical element'20179,516,976'Sanitary facility comprising a washstand and a support cabinet'20169,127,433'Formwork element'20159,075,174'Positioning unit and apparatus for adjustment of an optical element'20158,988,654'Support elements for an optical element'20158,793,862'Water-tight membrane'20148,760,777'Positioning unit and apparatus for adjustment of an optical element'20148,659,745'Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations'20148,542,346'Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations'20138,514,371'Imaging device in a projection exposure facility'20138,508,868'Holding arrangement for an optical element'20138,493,674'Positioning unit and alignment device for an optical element'20138,456,771'Holding arrangement for an optical element'20138,416,515'Positioning unit and alignment device for an optical element'20138,351,139'Optical element module with minimized parasitic loads'20138,035,903'Positioning unit and alignment device for an optical element'20118,027,024'Replacement device for an optical element'20117,986,472'Optical element module'20117,961,294'Imaging device in a projection exposure facility'20117,760,327'Reflecting optical element with eccentric optical passageway'20107,738,193'Positioning unit and alignment device for an optical element'20107,710,542'Imaging device in a projection exposure machine'20107,564,636'Device for preventing the displacement of an optical element'20097,515,359'Support device for positioning an optical element'20097,486,382'Imaging device in a projection exposure machine'20097,482,605'Energy filter device'20097,362,520'Device for the low-deformation mounting of a rotationally asymmetric optical element'20087,304,717'Imaging device in a projection exposure facility'20077,251,086'Apparatus for positioning an optical element in a structure'20077,242,537'Holding and positioning apparatus for an optical element'20077,239,462'Objective with at least one optical element'20077,079,331'Device for holding a beam splitter element'20067,014,328'Apparatus for tilting a carrier for optical elements'20066,967,792'Apparatus for positioning an optical element in a structure'20056,891,177'Ion beam scanner system and operating method'20056,842,294'Catadioptric objective'20056,744,574'Mount for an optical element in an optical imaging device'20046,724,548'Objective, in particular a projection lens for microlithography'20046,710,362'Device for irradiating a tumor tissue'20046,683,318'Ion beam therapy system and a method for operating the system'20046,271,976'Apparatus for tilting an object about at least one axis, in particular an optical element'20015,367,000'Process for the production of rigid foams containing urethane and isocyanurate groups'19944,610,618'Hydraulic press'19864,565,517'Hydraulic press for pressing mats of plastic material reinforced with glass fibers'19864,552,524'Hydraulic press'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–1986Based in Dortmund, DE· patent location history
2004–2011Patents assigned to ZEISS CARL SMT AG (17)· patent assignee history
2004–2021Based in Ulm, DE· patent location history
2004–2005Based in Darmstadt, DE· patent location history
2011–2021Patents assigned to ZEISS CARL SMT GMBH (23)· patent assignee history
2013–2015Patents assigned to WEBER ULRICH (7)· patent assignee history
2013–2015Patents assigned to KUGLER JENS (4)· patent assignee history
2013Patents assigned to HOLDERER HUBERT (3)· patent assignee history
2015Based in Dubai, AE· patent location history
2016Based in Haslach, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 23 | 2011–2021 |
| ZEISS CARL SMT AG | 17 | 2004–2011 |
| WEBER ULRICHself | 7 | 2013–2015 |
| KUGLER JENS | 4 | 2013–2015 |
| HOLDERER HUBERT | 3 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ulm, DE | 41 | 2004–2021 |
| Darmstadt, DE | 3 | 2004–2005 |
| Dortmund, DE | 3 | 1985–1986 |
| Haslach, DE | 1 | 2016 |
| Dubai, AE | 1 | 2015 |