Inventor
Hideaki Tsugane
Inventor
Fussa, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1035%
H10DInorganic electric semiconductor devices13%
H01JElectric discharge tubes or discharge lamps4%
H01LSemiconductor devices4%
H10BElectronic memory devices4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
9,748,081'Method of manufacturing semiconductor device and sputtering apparatus'20177,566,662'Method of dry cleaning silicon surface prior to forming self-aligned nickel silicide layer'20097,088,001'Semiconductor integrated circuit device with a metallization structure'20066,780,757'Semiconductor integrated circuit device and method for making the same'20046,764,945'Method of manufacturing a multilayer metallization structure with non-directional sputtering method'20046,583,049'Semiconductor integrated circuit device and method for making the same'20036,538,329'Semiconductor integrated circuit device and method for making the same'20036,372,554'Semiconductor integrated circuit device and method for production of the same'20026,300,237'Semiconductor integrated circuit device and method for making the same'20015,904,556'Method for making semiconductor integrated circuit device having interconnection structure using tungsten film'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2003Patents assigned to HITACHI LTD (5)· patent assignee history
1999–2003Patents assigned to HITACHI ULSI ENG CORP (4)· patent assignee history
1999–2006Based in Fussa, JP· patent location history
2001–2003Patents assigned to HITACHI MICROCOMP SYSTEM LTD (3)· patent assignee history
2002–2006Patents assigned to HITACHI ULSI SYS CO LTD (4)· patent assignee history
2004–2009Patents assigned to RENESAS TECH CORP (3)· patent assignee history
2009–2017Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 5 | 1999–2003 |
| HITACHI ULSI ENG CORP | 4 | 1999–2003 |
| HITACHI ULSI SYS CO LTD | 4 | 2002–2006 |
| HITACHI MICROCOMP SYSTEM LTD | 3 | 2001–2003 |
| RENESAS TECH CORP | 3 | 2004–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fussa, JP | 8 | 1999–2006 |
| Tokyo, JP | 2 | 2009–2017 |