Inventor
Johannes Bernardus Ridder
Inventor
Veldhoven, NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
B08BCleaning in general24%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light24%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them24%
PatentTitleYear
8,598,550'Ex-situ removal of deposition on an optical element'20138,289,498'Lithographic apparatus and device manufacturing method'20128,134,136'Ex-situ removal of deposition on an optical element'20127,767,989'Ex-situ removal of deposition on an optical element'20107,372,058'Ex-situ removal of deposition on an optical element'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2013Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2008–2013Based in Veldhoven, NL· patent location history
2012–2013Patents assigned to RIDDER JOHANNES BERNARDUS (3)· patent assignee history
2012–2013Patents assigned to SMITS JOSEPHUS JACOBUS (3)· patent assignee history
2012–2013Patents assigned to BANINE VADIM YEVGENYEVICH (2)· patent assignee history
2012–2013Patents assigned to IVANOV VLADIMIR VITALEVITCH (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2008–2013 |
| RIDDER JOHANNES BERNARDUSself | 3 | 2012–2013 |
| SMITS JOSEPHUS JACOBUS | 3 | 2012–2013 |
| BANINE VADIM YEVGENYEVICH | 2 | 2012–2013 |
| IVANOV VLADIMIR VITALEVITCH | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 5 | 2008–2013 |