Inventor

David S. H. Wong

Inventor
Hsinchu, TW

Overview

3→
Patents
2019–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation14%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry14%
B01LChemical or physical laboratory apparatus for general use14%
C02FTreatment of water, waste water, sewage, or sludge14%
C07CAcyclic or carbocyclic compounds14%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
G06FElectric digital data processing14%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019–2020Patents assigned to CHANG CHUN PETROCHEMICAL CO LTD (2)· patent assignee history
2019–2020Patents assigned to CHANG CHUN PLASTICS CO LTD (2)· patent assignee history
2019–2020Patents assigned to UNIV NAT TSING HUA (2)· patent assignee history
2019–2020Based in Hsinchu, TW· patent location history
2021Patents assigned to CHICAGO MERCANTILE EXCHANGE INC (1)· patent assignee history
2021Based in La Grange, IL, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHANG CHUN PETROCHEMICAL CO LTD22019–2020
CHANG CHUN PLASTICS CO LTD22019–2020
UNIV NAT TSING HUA22019–2020
CHICAGO MERCANTILE EXCHANGE INC12021
Locations
LocationPatentsSpan
Hsinchu, TW22019–2020
La Grange, Illinois, US12021