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Inventor

Tsuyoshi Mizuno

Inventor
Koshi, JP

Overview

22→
Patents
1981–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
H01LSemiconductor devices8%
B05CApparatus for applying fluent materials to surfaces, in general4%
B05DProcesses for applying fluent materials to surfaces, in general4%
B22DCasting of metals4%
B23BTurning4%
C23FNon-mechanical removal of metallic material from surface4%
Y10TTechnical subjects covered by former us classification4%
B08BCleaning in general2%
PatentTitleYear
10,985,846Signal separating apparatus and signal separating method202110,643,835Substrate processing apparatus, liquid processing method, and storage medium20209,252,009'Liquid processing apparatus'20168,864,933'Substrate treatment apparatus and substrate treatment method'20148,815,112'Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus'20148,684,014'Liquid processing apparatus for substrate and liquid processing method'20148,192,796'Substrate processing apparatus and substrate processing method'20127,968,468'Substrate treatment apparatus and substrate treatment method'20117,926,444'Method for forming thin film and film-forming device'20117,910,157'Substrate processing method and program'20117,757,626'Substrate processing apparatus and substrate processing method'20107,757,625'Method for forming thin film and film-forming device'20107,497,908'Film coating unit and film coating method'20097,416,474'Planarization apparatus'20087,322,496'Brick body for rotary nozzle'20087,290,685'Nozzle plate for a sliding nozzle apparatus'2007D0546849'Sliding nozzle plate'20076,878,401'Substrate processing method'20056,634,033'Rotating damper'20035,010,349'Plane patch antenna'19914,939,834'Machine tool with tool change mechanism'19904,252,480'Throw away insert and end mills'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2021Based in Yokosuka, JP· patent location history
2005–2020Patents assigned to TOKYO ELECTRON LTD (13)· patent assignee history
2007–2008Patents assigned to TOKYO YOGYO KK (3)· patent assignee history
2007Based in Gifu, JP· patent location history
2008–2014Based in Koshi, JP· patent location history
2008–2009Based in Tokyo, JP· patent location history
2012–2014Patents assigned to MIZUNO TSUYOSHI (4)· patent assignee history
2012–2014Patents assigned to TERADA SHOUICHI (2)· patent assignee history
2014Patents assigned to AMANO YOSHIFUMI (1)· patent assignee history
2016–2020Based in Kumamoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD132005–2020
MIZUNO TSUYOSHIself42012–2014
TOKYO YOGYO KK32007–2008
TERADA SHOUICHI22012–2014
AMANO YOSHIFUMI12014
Locations
LocationPatentsSpan
Koshi, JP102008–2014
Yokosuka, JP21991–2021
Kumamoto, JP22016–2020
Tokyo, JP22008–2009
Gifu, JP12007