Inventor
Boris Grek
Inventor
Hayward, CA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
B23KSoldering or unsoldering15%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
F28DHeat-exchange apparatus, not provided for in another subclass, in which the heat-exchange media do not come into direct contact3%
G01BMeasuring length, thickness or similar linear dimensions3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
H01LSemiconductor devices3%
PatentTitleYear
9,401,278'Apparatus and methods for improving the intensity profile of a beam image used to process a substrate'20168,746,975'Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography'20148,742,286'Apparatus and method for improving the intensity profile of a beam image used to process a substrate'20148,731,139'Evaporative thermal management of grazing incidence collectors for EUV lithography'20148,314,360'Apparatuses and methods for irradiating a substrate to avoid substrate edge damage'20128,153,930'Apparatus and methods for improving the intensity profile of a beam image used to process a substrate'20127,879,741'Laser thermal annealing of lightly doped silicon substrates'20117,840,104'Ultra-wide band AWG multiplexer'20107,744,274'Methods and apparatus for temperature measurement and control on a remote substrate surface'20107,639,908'Broadcasting arrayed waveguide'20097,514,305'Apparatus and methods for improving the intensity profile of a beam image used to process a substrate'20097,440,655'Duplex arrayed waveguide grating'20087,403,284'Integrated optics based high-resolution spectrophotometer'20087,292,616'CO2 laser stabilization systems and methods'20077,238,915'Methods and apparatus for irradiating a substrate to avoid substrate edge damage'20077,176,405'Heat shield for thermal processing'20077,148,159'Laser thermal annealing of lightly doped silicon substrates'20066,507,405'Fiber-optic interferometer employing low-coherence-length light for precisely measuring absolute distance and tilt'20036,347,176'Acousto-optical light tunnel apparatus and method'20026,097,488'Method and apparatus for measuring micro structures, anisotropy and birefringence in polymers using laser scattered light'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2003Based in Santa Clara, CA, US· patent location history
2006–2016Patents assigned to ULTRATECH INC (11)· patent assignee history
2006–2016Based in Hayward, CA, US· patent location history
2008Patents assigned to ANDEVICES INC (2)· patent assignee history
2009–2010Patents assigned to ENABLENCE USA COMPONENTS INC (2)· patent assignee history
2012–2014Patents assigned to GREK BORIS (5)· patent assignee history
2012–2014Patents assigned to MARKLE DAVID A (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ULTRATECH INC | 11 | 2006–2016 |
| GREK BORISself | 5 | 2012–2014 |
| MARKLE DAVID A | 3 | 2012–2014 |
| ANDEVICES INC | 2 | 2008 |
| ENABLENCE USA COMPONENTS INC | 2 | 2009–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hayward, California, US | 17 | 2006–2016 |
| Santa Clara, California, US | 3 | 2000–2003 |