Inventor
Yuki Osada
Inventor
Nirasaki, JP
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps22%
H01PWaveguides9%
C23CCoating metallic material8%
H05HPlasma technique8%
H05BElectric heating6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for5%
B60QArrangement of signalling or lighting devices, the mounting or supporting thereof or circuits therefor, for vehicles in general3%
G01CMeasuring distances, levels or bearings3%
G06KGraphical data reading3%
PatentTitleYear
10,557,200Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate202010,414,432Vehicle display device201910,324,470Vehicle control device and vehicle201910,293,749Vehicle control device and vehicle20199,702,913'Acquisition method for S-parameters in microwave introduction modules, and malfunction detection method'20179,548,187'Microwave radiation antenna, microwave plasma source and plasma processing apparatus'20179,520,273'Tuner, microwave plasma source and impedance matching method'20169,520,272'Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatus'20169,281,154'Microwave introducing mechanism, microwave plasma source and microwave plasma processing apparatus'20169,072,158'Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portion'20158,945,342'Surface wave plasma generating antenna and surface wave plasma processing apparatus'20158,308,898'Tuner and microwave plasma source'20128,163,128'Plasma processing apparatus'20127,915,827'Magnetron control method, magnetron service life judgment method, microwave generation device, magnetron service life judgment device, processing device, computer program, and storage medium'20117,445,690'Plasma processing apparatus'20087,355,379'Coaxial type impedance matching device and impedance detecting method for plasma generation'20087,226,524'Plasma processing apparatus'20077,176,634'Coaxial type impedance matching device and impedance detecting method for plasma generation'20077,070,333'Lubrication structure for rolling bearing'20066,856,211'Coaxial type impedance matching device'20056,819,052'Coaxial type impedance matching device and impedance detecting method for plasma generation'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2020Patents assigned to TOKYO ELECTRON LTD (17)· patent assignee history
2004–2016Based in Yamanashi, JP· patent location history
2006–2019Based in Tokyo, JP· patent location history
2007–2020Based in Nirasaki, JP· patent location history
2012–2015Patents assigned to KASAI SHIGERU (4)· patent assignee history
2012–2015Patents assigned to OSADA YUKI (4)· patent assignee history
2012–2015Patents assigned to IKEDA TARO (3)· patent assignee history
2019Patents assigned to SUBARU CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 17 | 2004–2020 |
| KASAI SHIGERU | 4 | 2012–2015 |
| OSADA YUKIself | 4 | 2012–2015 |
| IKEDA TARO | 3 | 2012–2015 |
| SUBARU CORP | 3 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 11 | 2007–2020 |
| Yamanashi, JP | 6 | 2004–2016 |
| Tokyo, JP | 4 | 2006–2019 |