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Inventor

Koichi Yatsuda

Inventor
Tokyo, JP

Overview

17→
Patents
2000–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01LSemiconductor devices19%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
H01JElectric discharge tubes or discharge lamps9%
C23CCoating metallic material5%
F16CShafts5%
H10DInorganic electric semiconductor devices5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
C08LCompositions of macromolecular compounds2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
PatentTitleYear
11,120,999Plasma etching method202111,056,349Method of fabricating semiconductor device, vacuum processing apparatus and substrate processing apparatus202111,004,684Forming method of hard mask202110,910,259Semiconductor device manufacturing method202110,840,359Method of forming FinFET source/drain contact202010,593,556Method of fabricating semiconductor device, vacuum processing apparatus and substrate processing apparatus202010,325,780Method of manufacturing semiconductor device201910,224,202Forming method of hard mask, forming apparatus of hard mask and recording medium20199,879,718'Sliding bearing and method for manufacturing sliding bearing'20189,863,466'Sliding bearing'20188,685,267'Substrate processing method'20148,641,916'Plasma etching apparatus, plasma etching method and storage medium'20148,198,183'Forming method of etching mask, control program and program storage medium'20128,114,781'Substrate processing method and substrate processing apparatus'20127,871,908'Method of manufacturing semiconductor device'20116,488,863'Plasma etching method'20026,156,151'Plasma processing apparatus'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2021Patents assigned to TOKYO ELECTRON LTD (15)· patent assignee history
2000Based in Yamanashi, JP· patent location history
2002Based in Saga, JP· patent location history
2011–2014Based in Nirasaki, JP· patent location history
2012–2014Patents assigned to YATSUDA KOICHI (4)· patent assignee history
2012Patents assigned to NISHIMURA EIICHI (2)· patent assignee history
2014Patents assigned to MOCHIKI HIROMASA (2)· patent assignee history
2014–2021Based in Tokyo, JP· patent location history
2018Patents assigned to TAIHO KOGYO CO LTD (2)· patent assignee history
2018Based in Toyota, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD152000–2021
YATSUDA KOICHIself42012–2014
MOCHIKI HIROMASA22014
NISHIMURA EIICHI22012
TAIHO KOGYO CO LTD22018
Locations
LocationPatentsSpan
Tokyo, JP92014–2021
Nirasaki, JP42011–2014
Toyota, JP22018
Saga, JP12002
Yamanashi, JP12000