Inventor

W. Karl Olander

Inventor
Indian Shores, FL, US

Overview

64→
Patents
1976–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 64 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds15%
B01DSeparation11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
F17CVessels for containing or storing compressed, liquefied or solidified gases10%
C23CCoating metallic material8%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium6%
H01JElectric discharge tubes or discharge lamps5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
Y10TTechnical subjects covered by former us classification4%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
PatentTitleYear
10,229,840Ion implanter comprising integrated ventilation system20199,991,095Ion source cleaning in semiconductor processing systems20189,455,147'Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation'20169,383,064'Ventilation gas management systems and processes'20168,603,252'Cleaning of semiconductor processing systems'20138,389,068'Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation'20138,282,023'Fluid storage and dispensing systems, and fluid supply processes comprising same'20127,951,225'Fluid storage and dispensing systems, and fluid supply processes comprising same'20117,943,204'Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation'20117,857,880'Semiconductor manufacturing facility utilizing exhaust recirculation'20107,819,981'Methods for cleaning ion implanter components'20107,798,168'Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases'20107,614,421'Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases'20097,485,169'Semiconductor manufacturing facility utilizing exhaust recirculation'20097,364,603'Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream'20087,328,716'Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases'20087,284,564'Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rate'20077,105,037'Semiconductor manufacturing facility utilizing exhaust recirculation'20066,997,202'Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rate'20066,868,869'Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases'20056,857,447'Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases'20056,845,619'Integrated system and process for effluent abatement and energy generation'20056,841,141'System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambers'20056,805,728'Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream'20046,770,117'Ion implantation and wet bench systems utilizing exhaust gas recirculation'20046,660,063'Sorbent-based gas storage and delivery system'20036,517,594'Air management system and method for chemical containment and contamination reduction in a semiconductor manufacturing facility'20036,471,750'Gas cabinet assembly comprising back migration scrubber unit'20026,030,591'Process for removing and recovering halocarbons from effluent process streams'20006,001,172'Apparatus and method for the in-situ generation of dopants'19995,972,743'Precursor compositions for ion implantation of antimony and ion implantation process utilizing same'19995,914,091'Point-of-use catalytic oxidation apparatus and method for treatment of voc-containing gas streams'19995,851,270'Low pressure gas source and dispensing apparatus with enhanced diffusive/extractive means'19985,837,027'Manufacturing process for gas source and dispensing systems'19985,704,965'Fluid storage and delivery system utilizing carbon sorbent medium'19985,704,967'Fluid storage and delivery system comprising high work capacity physical sorbent'19984,684,681'Flow enhanced polyphenylene ether resin compositions'19874,427,594'Oxidative coupling of phenolic monomers with manganese complexes of phenyl benzoin oxime catalysts'19844,335,234'Use of manganese chelate to oxidatively couple phenolic compound in a self-precipitating system'19824,312,803'Thermally stable polycarbonate compositions'19824,287,321'Poly(phenylene ether)poly(vinyl aromatic) compositions'19814,280,963'Manganese complexes of salicylaldehyde-alkanolimines as catalysts for the polymerization of 2,6-di-substituted phenols'19814,276,233'Hindered phenol phosphites'19814,225,528'Manganese complexes of phenyl benzoin in oxime catalysts'19804,221,735'Complexed manganese catalyst'19804,207,406'Process for preparing polyphenylene oxide copolymers'19804,205,007'Manganese complexes of salicyl-aldehyde-alkanolimines as catalysts for the polymerization of 2,6-di-substituted phenols'19804,187,361'Method for preparing polyphenylene oxides with manganese-vinyl resin complexes'19804,184,999'Stabilized polyphenylene ether resin compositions containing hindered phenols'19804,184,034'Manganese benzoin-imine catalysts and process of preparing polyphenylene ethers using said compounds as catalysts'19804,130,544'Oxidative coupling of phenolic monomers by the programmed addition of complexed manganese catalysts'19784,110,312'Method for preparing polyphenylene oxides with manganese-vinyl resin complexes'19784,102,865'Moderation of manganese chelate catalyzed polymerization of phenolic monomers with polyfunctional alkanolamines'19784,098,846'Polyphenylene oxide polystyrene product-by-process'19784,097,462'Process for making polyphenylene oxides'19784,093,596'Method for polymerization of polyphenylene oxides'19784,093,598'Oxidative coupling of phenolic monomers in the presence of manganese complexes of manganese phenyl benzoin oxime catalysts'19784,093,597'Polymerization of 2,6-di-substituted phenols'19784,083,828'Preparation of polyphenylene oxides by the oxidative coupling of a phenolic monomer in the presence of a manganese salt, base and a secondary amine'19784,075,174'Promotion of manganese chelate catalyzed polyphenylene ether oxide polymerization reactions'19784,054,553'Polyphenylene oxide process'19773,972,851'Preparation of polyphenylene oxide using a manganese(II) ortho-hydroxyarene-oxime chelate reaction promoter'19763,965,069'Polyphenylene oxide is prepared using a mixture of manganese chelates as a catalyst'19763,956,242'Preparation of polyphenylene oxide using a manganese (II) .omega.-hydroxyoxime chelate reaction promoter'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–1987Patents assigned to GEN ELECTRIC (28)· patent assignee history
1976Based in Elnora, NY, US· patent location history
1978–1984Based in Clifton Park, NY, US· patent location history
1978–1987Based in Mt. Vernon, IN, US· patent location history
1998–2013Patents assigned to ADVANCED TECH MATERIALS (29)· patent assignee history
1998–1999Based in Tampa, FL, US· patent location history
2002–2019Based in Indian Shores, FL, US· patent location history
2012–2018Patents assigned to OLANDER W KARL (5)· patent assignee history
2013–2018Patents assigned to KAIM ROBERT (3)· patent assignee history
2016–2019Patents assigned to ENTEGRIS INC (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADVANCED TECH MATERIALS291998–2013
GEN ELECTRIC281976–1987
OLANDER W KARLself52012–2018
ENTEGRIS INC42016–2019
KAIM ROBERT32013–2018
Locations
LocationPatentsSpan
Indian Shores, Florida, US282002–2019
Clifton Park, New York, US141978–1984
Mt. Vernon, IN, US91978–1987
Tampa, Florida, US41998–1999
Elnora, New York, US31976