Inventor
Nobutaka Fujimori
Inventor
Fujisawa, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices78%
G02BOptical elements, systems or apparatus11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
PatentTitleYear
6,538,724'Exposure apparatus'20036,204,912'Exposure method, exposure apparatus, and mask'20015,995,199'Position measurement method for measuring a position of an exposure mask and exposure method for transferring an image of the pattern formed in an exposure mask'19995,973,766'Exposure method and exposure device'19995,912,726'Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system'1999H0001733'Exposure method'19985,565,988'Alignment method and apparatus'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2003Patents assigned to NIKON CORP (6)· patent assignee history
1996–2003Based in Fujisawa, JP· patent location history
1998Patents assigned to NIPPON KOGAKU KK (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 6 | 1996–2003 |
| NIPPON KOGAKU KK | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fujisawa, JP | 7 | 1996–2003 |