Inventor
Guoheng Zhao
Inventor
Milpitas, CA, US
Overview
Patents· 76 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties36%
G02BOptical elements, systems or apparatus10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light7%
G01BMeasuring length, thickness or similar linear dimensions6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
H01LSemiconductor devices4%
G06TImage data processing or generation, in general2%
H04NPictorial communication, e.g. television2%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution2%
PatentTitleYear
11,088,508Controlling beam divergence in a vertical-cavity surface-emitting laser202110,816,464Imaging reflectometer202010,739,275Simultaneous multi-directional laser wafer inspection202010,670,537Systems and methods for defect material classification202010,634,487Method and system for optical three dimensional topography measurement202010,599,044Digital lithography with extended field size202010,495,446Methods and apparatus for measuring height on a semiconductor wafer201910,488,348Wafer inspection201910,474,041Digital lithography with extended depth of focus201910,462,391Dark-field inspection using a low-noise sensor201910,234,402Systems and methods for defect material classification201910,228,331Methods and apparatus for polarized wafer inspection20199,945,792Generating an array of spots on inclined surfaces20189,915,622'Wafer inspection'20189,891,177'TDI sensor in a darkfield system'20189,886,764'Image acquisition system, image acquisition method, and inspection system'20189,874,526Methods and apparatus for polarized wafer inspection20189,678,350'Laser with integrated multi line or scanning beam capability'20179,645,097'In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning'20179,553,034'Combined semiconductor metrology system'20179,291,575'Wafer inspection'20169,279,774'Wafer inspection'20169,194,811'Apparatus and methods for improving defect detection sensitivity'20159,182,358'Multi-spot defect inspection system'20159,176,072'Dark field inspection system with ring illumination'20159,086,389'Sample inspection system detector'20159,001,327'Composite polarizer with adjustable polarization angles'20158,891,079'Wafer inspection'20148,879,056'Multi-spot illumination for wafer inspection'20148,817,250'Air bearing for substrate inspection device'20148,604,447'Solar metrology methods and apparatus'20138,462,329'Multi-spot illumination for wafer inspection'20138,436,554'LED solar illuminator'20138,415,961'Measuring sheet resistance and other properties of a semiconductor'20138,283,631'In-situ differential spectroscopy'20128,194,240'Enhanced focusing capability on a sample using a spot matrix'20128,194,301'Multi-spot scanning system and method'20127,989,729'Detecting and repairing defects of photovoltaic devices'20117,869,023'System for detecting anomalies and/or features of a surface'20117,821,654'System for scatterometric measurements and applications'20107,733,111'Segmented optical and electrical testing for photovoltaic devices'20107,709,794'Defect detection using time delay lock-in thermography (LIT) and dark field LIT'20107,607,647'Stabilizing a substrate using a vacuum preload air bearing chuck'20097,564,544'Method and system for inspecting surfaces with improved light efficiency'20097,525,649'Surface inspection system using laser line illumination with two dimensional imaging'20097,515,253'System for measuring a sample with a layer containing a periodic diffracting structure'20097,511,830'System for scatterometric measurements and applications'20097,433,037'System for measuring periodic structures'20087,375,810'Overlay error detection'20087,369,233'Optical system for measuring samples using short wavelength radiation'20087,345,754'Fourier filters and wafer inspection systems'20087,319,229'Illumination apparatus and methods'20087,301,649'System for scatterometric measurements and applications'20077,295,303'Methods and apparatus for inspecting a sample'20077,280,199'System for detecting anomalies and/or features of a surface'20077,221,444'Method and system for improved defect sensitivity for inspecting surfaces'20077,119,897'Sample inspection system'20067,099,005'System for scatterometric measurements and applications'20067,088,443'System for detecting anomalies and/or features of a surface'20067,079,238'Sample inspection system'20067,064,821'Sample inspection system'20067,009,704'Overlay error detection'20066,891,611'Sample inspection system'20056,753,528'System for MEMS inspection and characterization'20046,724,473'Method and system using exposure control to inspect a surface'20046,721,052'Systems for measuring periodic structures'20046,710,876'Metrology system using optical phase'20046,707,540'In-situ metalization monitoring using eddy current and optical measurements'20046,671,051'Apparatus and methods for detecting killer particles during chemical mechanical polishing'20036,657,715'Sample inspection system'20036,639,662'Sample inspection system'20036,628,397'Apparatus and methods for performing self-clearing optical measurements'20036,618,134'Sample inspection system'20036,608,676'System for detecting anomalies and/or features of a surface'20036,384,910'Sample inspection system'20026,201,601'Sample inspection system'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2020Patents assigned to KLA TENCOR CORP (48)· patent assignee history
2001–2007Based in Sunnyvale, CA, US· patent location history
2003–2021Based in Milpitas, CA, US· patent location history
2004–2009Patents assigned to KLA TENCOR TECH CORP (19)· patent assignee history
2006–2007Based in Milipitas, CA, US· patent location history
2012–2017Patents assigned to ZHAO GUOHENG (13)· patent assignee history
2012–2016Patents assigned to VAEZ-IRAVANI MEHDI (8)· patent assignee history
2013–2020Based in Palo Alto, CA, US· patent location history
2019–2020Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 48 | 2001–2020 |
| KLA TENCOR TECH CORP | 19 | 2004–2009 |
| ZHAO GUOHENGself | 13 | 2012–2017 |
| VAEZ-IRAVANI MEHDI | 8 | 2012–2016 |
| APPLIED MATERIALS INC | 3 | 2019–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Milpitas, California, US | 38 | 2003–2021 |
| Palo Alto, California, US | 26 | 2013–2020 |
| Sunnyvale, California, US | 10 | 2001–2007 |
| Milipitas, California, US | 2 | 2006–2007 |