Inventor
Masao Sugiyama
Inventor
Tokyo, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices19%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1019%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
B29CShaping or joining of plastics6%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts6%
B29LIndexing scheme associated with subclass b29c, relating to particular articles6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
B29BPreparation or pretreatment of the material to be shaped4%
F16HGearing4%
PatentTitleYear
11,038,234Battery pack, electronic device, electrically driven vehicle, electric tool, and power storage system202110,265,886Method of manufacturing molding material, molding die for use in the manufacturing method, and method of manufacturing resin rotator20199,962,887Method of manufacturing fiber substrate and method of manufacturing resin rotator20189,925,700'Method and apparatus of manufacturing molding material, and method of manufacturing resin gear'20189,376,688'Method of producing cyclamen with multi-petaled flowers'20168,110,878'Semiconductor device having a plurality of shallow wells'20128,017,464'Semiconductor integrated circuit device and a method for manufacturing a semiconductor integrated circuit device'20117,982,271'Semiconductor device'20117,821,076'Semiconductor device'20106,800,428'Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography'20046,723,614'Semiconductor device comprising layered positional detection marks and manufacturing method thereof'20046,620,666'METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE OF DUAL-GATE CONSTRUCTION, AND SEMICONDUCTOR DEVICE MANUFACTURED THEREBY INCLUDING FORMING A REGION OF OVER-LAPPING N-TYPE AND P-TYPE IMPURITIES WITH LOWER RESISTANCE'20036,545,771'Facsimile apparatus and information printing method of facsimile apparatus'20036,486,558'Semiconductor device having a dummy pattern'20026,461,946'Method of manufacturing semiconductor device'20026,421,932'Method and apparatus for drying substrate plates'20026,344,697'Semiconductor device comprising layered positional detection marks and manufacturing method thereof'20026,165,878'Method of manufacturing semiconductor device'20005,956,617'Method of manufacturing a semiconductor device employing salicide technology'19995,635,746'Semiconductor device comprising a salicide structure'19975,600,170'Interconnection structure of semiconductor device'19975,152,138'Exhaust system for sideway-mounted engine'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2003Patents assigned to MITSUBISHI ELECTRIC CORP (8)· patent assignee history
1997–2019Based in Tokyo, JP· patent location history
1997–2004Based in Hyogo, JP· patent location history
2004Based in Kawasaki, JP· patent location history
2010–2012Patents assigned to RENESAS ELECTRONICS CORP (4)· patent assignee history
2012–2016Patents assigned to SUGIYAMA MASAO (2)· patent assignee history
2016Based in Atsugi, JP· patent location history
2018–2019Patents assigned to HITACHI CHEMICAL CO LTD (3)· patent assignee history
2018–2019Patents assigned to SHIN KOBE ELECTRIC MACHINERY CO LTD (2)· patent assignee history
2021Based in Kyoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 8 | 1997–2003 |
| RENESAS ELECTRONICS CORP | 4 | 2010–2012 |
| HITACHI CHEMICAL CO LTD | 3 | 2018–2019 |
| SHIN KOBE ELECTRIC MACHINERY CO LTD | 2 | 2018–2019 |
| SUGIYAMA MASAOself | 2 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 13 | 1997–2019 |
| Hyogo, JP | 3 | 1997–2004 |
| Kyoto, JP | 1 | 2021 |
| Atsugi, JP | 1 | 2016 |
| Kawasaki, JP | 1 | 2004 |