Inventor
Shingo Nohara
Inventor
Toyama, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material29%
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01JElectric discharge tubes or discharge lamps6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
PatentTitleYear
10,032,626Method of manufacturing semiconductor device by forming a film on a substrate, substrate processing apparatus, and recording medium20189,881,789'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'20189,865,451'Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'20189,831,082Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and non-transitory computer-readable recording medium20179,793,107'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'20179,698,007'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'20179,673,043'Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and recording medium'20179,620,357'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'20179,349,586'Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and non-transitory computer-readable recording medium'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2018Patents assigned to HITACHI INT ELECTRIC INC (9)· patent assignee history
2016–2018Based in Toyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 9 | 2016–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 9 | 2016–2018 |