Inventor
Shuzo Hattori
Inventor
Nagoya, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light12%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%
H01JElectric discharge tubes or discharge lamps6%
H05KPrinted circuits6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
PatentTitleYear
5,249,032'Optical position-detecting apparatus'19935,064,711'Substrate of a hybrid IC, method of forming a circuit pattern and apparatus of forming the same'19914,974,227'Low-pressure mercury resonance radiation source'19904,937,489'Electrostrictive actuators'19904,891,242'Substrate of a hybrid ic, method of forming a circuit pattern and apparatus of forming the same'19904,873,709'X-ray generator with grooved rotary anode'19894,870,865'Device for testing formation of connection'19894,773,218'Pulse actuated hydraulic pump'19884,760,265'Method and device for detecting defects of patterns in microelectronic devices'19884,664,524'Optical self-alignment system'19874,660,941'Light deflection apparatus'19874,421,842'Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film'19834,421,843'Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film'19834,420,835'Hollow cathode laser'19834,382,985'Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film'19834,283,482'Dry Lithographic Process'19814,264,206'Dust particle analyzer'19814,257,014'Gas laser discharge tube using corrugated cathode'19814,232,274'Metal vapor laser system'19804,075,516'Diffraction electroacoustic transducer'19784,031,428'Discharge tube having multiple electrodes arranged in tandem'19773,944,812'Electrooptic thin-film modulator'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1978Patents assigned to HAGIWARA DENKI KK (2)· patent assignee history
1976–1983Based in Nagoya, JP· patent location history
1977–1983Patents assigned to KIMMON ELECTRIC CO LTD (5)· patent assignee history
1983Patents assigned to DAIKIN IND LTD (3)· patent assignee history
1987–1991Patents assigned to HATTORI SHUZO (5)· patent assignee history
1987–1991Based in Toyota-shi, Aichi-ken, JP· patent location history
1987–1990Based in Aichi, JP· patent location history
1988–1991Patents assigned to TOYODA AUTOMATIC LOOM WORKS (3)· patent assignee history
1990Based in Nagakute-shi, JP· patent location history
1993Based in Niwa-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HATTORI SHUZOself | 5 | 1987–1991 |
| KIMMON ELECTRIC CO LTD | 5 | 1977–1983 |
| DAIKIN IND LTD | 3 | 1983 |
| TOYODA AUTOMATIC LOOM WORKS | 3 | 1988–1991 |
| HAGIWARA DENKI KK | 2 | 1976–1978 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nagoya, JP | 11 | 1976–1983 |
| Toyota-shi, Aichi-ken, JP | 5 | 1987–1991 |
| Aichi, JP | 4 | 1987–1990 |
| Niwa-gun, JP | 1 | 1993 |
| Nagakute-shi, JP | 1 | 1990 |