Inventor
Ken Ebihara
Inventor
Shizuoka, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
G03GElectrography15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
Y10TTechnical subjects covered by former us classification9%
C03CChemical composition of glasses, glazes or vitreous enamels6%
G21KHandling of particles or ionising radiation not otherwise provided for6%
A61KPreparations for medical, dental or toiletry purposes3%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations3%
C03BManufacture, shaping, or supplementary processes3%
PatentTitleYear
9,931,351Method for improving leptin resistance20188,168,352'Reflective mask blank for EUV lithography and mask for EUV lithography'20128,029,950'Reflective mask blank for EUV lithography'20118,012,653'Substrate for EUV mask blanks'20117,960,077'Reflective-type mask blank for EUV lithography'20117,712,333'Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography'20107,678,511'Reflective-type mask blank for EUV lithography'20105,532,721'Dielectric drum and electrostatic recording device using the same'19965,397,666'Electrophotographic photoreceptor and process for producing the same'19955,219,691'Electrophotographic photoreceptor and process for producing the same'19935,132,200'Electrophotographic photoreceptor with porous anodized Al layer and process for producing the same'19925,120,626'Electrophotographic photoreceptor having an anodized Al-Mg or Al-Mn alloy substrate and process for producing the same'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–1996Patents assigned to FUJI XEROX CO LTD (5)· patent assignee history
1992–1996Patents assigned to NIKKEI TECHNO RESEARCH CO LTD (3)· patent assignee history
1992–1996Patents assigned to NIPPON LIGHT METAL CO (3)· patent assignee history
1992–1996Based in Shizuoka, JP· patent location history
2010–2012Patents assigned to ASAHI GLASS CO LTD (6)· patent assignee history
2010–2011Based in Chiyoda-ku, JP· patent location history
2010–2011Based in Matsudo, JP· patent location history
2011–2012Based in Tokyo, JP· patent location history
2012Patents assigned to EBIHARA KEN (1)· patent assignee history
2018Based in Shimotsuke, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASAHI GLASS CO LTD | 6 | 2010–2012 |
| FUJI XEROX CO LTD | 5 | 1992–1996 |
| NIKKEI TECHNO RESEARCH CO LTD | 3 | 1992–1996 |
| NIPPON LIGHT METAL CO | 3 | 1992–1996 |
| EBIHARA KENself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 5 | 1992–1996 |
| Tokyo, JP | 2 | 2011–2012 |
| Chiyoda-ku, JP | 2 | 2010–2011 |
| Matsudo, JP | 2 | 2010–2011 |
| Shimotsuke, JP | 1 | 2018 |