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Inventor

Yukihiro Abe

Inventor
Mishima, JP

Overview

20→
Patents
1989–2021
Patent span
Physics
Primary field (CPC G)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography26%
H01JElectric discharge tubes or discharge lamps14%
B41MPrinting, duplicating, marking, or copying processes11%
C23CCoating metallic material11%
B01DSeparation6%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general6%
G05BControl or regulating systems in general6%
H05HPlasma technique6%
C07CAcyclic or carbocyclic compounds3%
C07DHeterocyclic compounds3%
PatentTitleYear
10,908,579Controller, control program, and control system202110,901,398Controller, control program, control system, and control method202110,642,175Electrophotographic photosensitive member and method for producing electrophotographic photosensitive member202010,338,486Electrophotographic photosensitive member and electrophotographic apparatus20199,372,416'Method for manufacturing electrophotographic photosensitive member'20168,771,908'Electrophotographic apparatus and electrophotographic photosensitive member'20147,799,496'Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus'20107,732,113'Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus, and process for producing electrophotographic photosensitive member'20107,704,657'Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus'20107,550,180'Plasma treatment method'20097,051,671'Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article'20066,861,373'Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode'20056,761,128'Plasma treatment apparatus'20046,443,191'Vacuum processing methods'20026,023,930'Black smoke eliminating device for internal combustion engine and exhaust gas cleaning system including the device'20006,021,639'Black smoke eliminating device for internal combustion engine and exhaust gas cleaning system including the device'20005,206,210'Heat-sensitive recording material'19935,143,890'Heat sensitive recording material'19924,898,941'Process for preparing diphenylalkene derivatives'19904,803,193'Heat-sensitive recording material using chromeno compound'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–1993Patents assigned to KANZAKI PAPER MFG CO LTD (4)· patent assignee history
2000Patents assigned to MITSUBISHI HEAVY IND LTD (2)· patent assignee history
2000Based in Kanagawa, JP· patent location history
2002–2020Patents assigned to CANON KK (12)· patent assignee history
2002–2009Based in Shizuoka, JP· patent location history
2010–2016Based in Mishima, JP· patent location history
2014–2016Patents assigned to ABE YUKIHIRO (2)· patent assignee history
2019–2020Based in Kashiwa, JP· patent location history
2021Patents assigned to OMRON TATEISI ELECTRONICS CO (2)· patent assignee history
2021Based in Ibaraki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK122002–2020
KANZAKI PAPER MFG CO LTD41989–1993
ABE YUKIHIROself22014–2016
MITSUBISHI HEAVY IND LTD22000
OMRON TATEISI ELECTRONICS CO22021
Locations
LocationPatentsSpan
Mishima, JP52010–2016
Shizuoka, JP52002–2009
Ibaraki, JP22021
Kashiwa, JP22019–2020
Kanagawa, JP22000