Inventor
Hideki Lee
Inventor
Nirasaki, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material39%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests22%
B08BCleaning in general9%
H01JElectric discharge tubes or discharge lamps9%
PatentTitleYear
5,951,772'Vacuum processing apparatus'19995,785,796'Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus'19985,711,815'Film forming apparatus and film forming method'19985,647,945'Vacuum processing apparatus'19975,637,153'Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus'19975,616,208'Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus'19975,525,160'Film deposition processing device having transparent support and transfer pins'19965,380,370'Method of cleaning reaction tube'19955,180,692'Method for the manufacture of boron-containing films by CVD or epitaxial techniques using boron trifluoride'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1999Patents assigned to TOKYO ELECTRON LTD (9)· patent assignee history
1993–1999Based in Nirasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 9 | 1993–1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 9 | 1993–1999 |