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Inventor

Kuo-Lung Tang

Inventor
Hsinchu, TW

Overview

3→
Patents
2005–2006
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1060%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
PatentTitleYear
7,105,454'Use of ammonia for etching organic low-k dielectrics'20067,049,052'Method providing an improved bi-layer photoresist pattern'20066,893,969'Use of ammonia for etching organic low-k dielectrics'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2006Patents assigned to LAM RES CORP (3)· patent assignee history
2005–2006Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LAM RES CORP32005–2006
Locations
LocationPatentsSpan
Hsinchu, TW32005–2006